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Preliminary design of multi-function LIGA beamline

SYNCHROTRON TECHNOLOGY AND APPLICATIONS

Preliminary design of multi-function LIGA beamline

WANG Na-Xiu
ZHENG Hong-Wei
Nuclear Science and TechniquesVol.17, No.1pp.11-15Published in print 20 Feb 2006
47500

One design of multi-function LIGA beamline has been reported. In this design, two plane mirrors and a series of filters have been employed. One can choose the spectrum range of X-ray easily according to the exposure requirement by adjusting the grazing angle of mirrors and the thickness of filters. And the spot size in the horizontal direction is up to 120mm, which is large enough for exposing 5 inch silicon slice. The typical exposure time is about 1.2h, 1.8h, 0.5h, corresponding to PMMA thickness of 500μm, 200μm, 20μm, respectively.

Synchrotron radiationBeamlineLithography electroforming micro moldingX-ray lithography
References
[1] ANKA Lithography Methods, Beamline: ANKA-Litho I, ANKA-Litho il, ANKA-Litho III.
[2] Pantenburg F J, Chlebek J, El-Kholi A, et al. Microelectronic Engineering, 1994, 23: 223-226
[3] Yi F, Jin M, Tang E, et al. Microsystem Technologies, 1996, 3: 7-9
[4] Lehr H, Ehrfeld W.

LIGA-Technique, An overview

. The 6th Chinese International Summer School of Physics Application of Synchrotron Radiation, Lecture Notes, 23-46
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