Uncertainty of an automatic system for counting alpha tracks on CR-39

Dun-Huang Fan; Wei-Hai Zhuo; Bo Chen; Wei-Yuan Zhang

doi:10.1007/s41365-017-0314-8

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Uncertainty of an automatic system for counting alpha tracks on CR-39

NUCLEAR ELECTRONICS AND INSTRUMENTATION | Updated：2021-02-26

- Uncertainty of an automatic system for counting alpha tracks on CR-39
- Nuclear Science and Techniques Vol. 28, Issue 11, Article number: 164(2017)
- Affiliations：
  
  1.Institute of Radiation Medicine, Fudan University, Shanghai 200032, China
- Author bio：
  
  Corresponding author. E-mail address: bochenfys@fudan.edu.cn
- Funds：
- DOI：10.1007/s41365-017-0314-8
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Dun-Huang Fan, Wei-Hai Zhuo, Bo Chen, et al. Uncertainty of an automatic system for counting alpha tracks on CR-39. [J]. Nuclear Science and Techniques 28(11):164(2017)
DOI：

Dun-Huang Fan, Wei-Hai Zhuo, Bo Chen, et al. Uncertainty of an automatic system for counting alpha tracks on CR-39. [J]. Nuclear Science and Techniques 28(11):164(2017) DOI： 10.1007/s41365-017-0314-8.

摘要

Abstract

For accurate counting of alpha tracks on the polyallyl diglycol carbonate (PADC) of CR-39 type track detectors, the size distributions of both artifact tracks and alpha tracks were investigated with an automatic counting system. At the same temperature and etchant concentration, the numbers and sizes of alpha tracks changed significantly with the etching time, and the artifact track changes were smaller. At the etching time of 5 h, the sizes of alpha tracks were evidently larger than those of the artifact tracks, and the deviation of its size distribution was much smaller than those of longer etching time. Based on the size distribution of alpha tracks etched for 5 h, the overlap effect and uncertainty of overlap correction were studied by the Monte Carlo simulations for different track densities. It was found that the counting uncertainty of the system could be less than 6% in a density range of 10–160 tracks·mm,−2, after taking the overlap correction into account.

关键词

Keywords

UncertaintyTrack countingCR-39EtchingOverlap

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Related Institution

Shanghai Institute of Applied Physics, CAS

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