Amplification process of a gas electron multiplier simulated by PIC-MCC model

Lanlan YANG; Yan TU; Tolner Harm; Xuefei ZHONG; Panpan ZHANG; Nana QIN; Shanle MA

doi:10.13538/j.1001-8042/nst.23.203-208

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Amplification process of a gas electron multiplier simulated by PIC-MCC model

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- Amplification process of a gas electron multiplier simulated by PIC-MCC model
- Amplification process of a gas electron multiplier simulated by PIC-MCC model
- 核技术（英文版） 2012年23卷第4期
- 作者机构：
  
  1.School of Electronic Science and Engineering, Southeast University, Nanjing 210096, China
- 作者简介：
  
  Corresponding author. E-mail address: jujube_yang@seu.edu.cn
  
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- 基金信息：
  
  National Natural Science Foundation of China;Foundation for Excellent Youth Scholars of Southeast University()
- DOI：10.13538/j.1001-8042/nst.23.203-208 中图分类号：
- 纸质出版日期：2012-08-20，
  
  收稿日期：2012-02-23，
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引用本文
Lanlan YANG, Yan TU, Tolner Harm, 等. Amplification process of a gas electron multiplier simulated by PIC-MCC model[J]. 核技术（英文版）, 2012, 23(4):203-208.

Lanlan YANG, Yan TU, Tolner Harm, et al. Amplification process of a gas electron multiplier simulated by PIC-MCC model[J]. Nuclear Science and Techniques, 2012, 23(4):203-208.
Lanlan YANG, Yan TU, Tolner Harm, 等. Amplification process of a gas electron multiplier simulated by PIC-MCC model[J]. 核技术（英文版）, 2012, 23(4):203-208. DOI： 10.13538/j.1001-8042/nst.23.203-208.

Lanlan YANG, Yan TU, Tolner Harm, et al. Amplification process of a gas electron multiplier simulated by PIC-MCC model[J]. Nuclear Science and Techniques, 2012, 23(4):203-208. DOI： 10.13538/j.1001-8042/nst.23.203-208.

Amplification process of a gas electron multiplier simulated by PIC-MCC model 1 corresp first-author Corresponding author. E-mail address: jujube_yang@seu.edu.cn Corresponding author. E-mail address: jujube_yang@seu.edu.cn jujube_yang@seu.edu.cn 1 1 1 1 1 1 School of Electronic Science and Engineering, Southeast University, Nanjing 210096, China School of Electronic Science and Engineering, Southeast University, Nanjing 210096, China The performance of a single gas electron multiplier (GEM) in pure Xe at an atmospheric pressure is investigated by Particle in Cell-Monte Carlo Collision (PIC-MCC) model. The micro development processes with electrons and ions distributions in space have been revealed. Based on the micro development processes, the macroscopic parameters such as GEM gain and the effective efficiency have also been obtained. The simulation results indicate that after tens of nanoseconds, electrons are collected by the readout electrode while the ions still exist in the gas space for several microseconds. The main signal current is formed by the electrons arriving at the readout electrode, but electrons and ions are also collected by the copper electrodes near the GEM hole and the thin Kapton film boundary. The simulated gain of GEM exponentially increases with the applied GEM voltage. With the PIC-MCC simulations, both the physical amplification and charging mechanisms in the GEM device can be well understood, which is beneficial to the device design. Gas electron multiplier Particle in Cell-Monte Carlo Collision Gain References Sauli F . Nucl Instrum Meth A , 1997 , 386 : 531 - 534 . Nucl Instrum Meth A Bachmann S , Bressan A , Kappler S , et al . Nucl Instrum Meth A , 2001 , 471 : 115 - 119 . Nucl Instrum Meth A Buzulutskov A . Nucl Instrum Meth A , 2002 , 494 : 148 - 155 . Nucl Instrum Meth A Liu J , Lai Y F , Cheng J P , et al . Nucl Sci Tech , 2005 , 16 : 225 - 230 . (in Chinese) Nucl Sci Tech An S H , Li C , Zhou Y , et al . Nucl Sci Tech , 2004 , 15 : 290 - 293 . (in Chinese) Nucl Sci Tech Sharma A . Nucl Instrum Meth A , 2000 , 454 : 267 - 271 Nucl Instrum Meth A Bouianov O , Bouianov M , Orava R , et al . Nucl Instrum Meth A , 2000 , 450 : 277 - 287 . Nucl Instrum Meth A Tikhonov V , Veenhof R . Nucl Instrum Meth A , 2002 , 478 : 452 - 459 . Nucl Instrum Meth A Bachmann S , Bressan A , Ropelewski L , et al . Nucl Instrum Meth A , 1999 , 438 : 376 - 408 . Nucl Instrum Meth A Verboncoeur J P , Langdon A B , Gladd N T . Comp Phys Comm 1995 , 87 : 199 - 211 . Comp Phys Comm Bruhwiler D L , Giacone R E , Cary J R , et al . Phys Rev ST Accel Beams , 2001 , 4 : 101302 , Phys Rev ST Accel Beams Yang L L , Tu Y , Zhang P P , et al . Nucl Tech , 2011 , 34 : 543 - 548 . (in Chinese) Nucl Tech Amaro F D , Conceicao A S , Veloso J F C A , et al . Nucl Instrum Meth A , 2007 , 579 : 62 - 66 . Nucl Instrum Meth A Roth J C . Industrial plasma engineering , Vol. 1 , Principles , IOP Publishing , 1995 . Principles 10.13538/j.1001-8042/nst.23.203-208 Supported by the National Natural Science Foundation of China under Contract No.50907009 and 60871015, the Foundation for Excellent Youth Scholars of Southeast University 2012-02-23 2012-08-20 2021-01-19 2012 Nuclear Science and Techniques 04 23

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