Preliminary design of multi-function LIGA beamline

Preliminary design of multi-function LIGA beamline 1 first-author 2 Shanghai Institute of Applied Physics, the Chinese Academy of Sciences, Shanghai 201800, China Shanghai Institute of Applied Physics, the Chinese Academy of Sciences, Shanghai 201800, China Institute of High Energy Physics, the Chinese Academy of Sciences, Beijing100049, China Institute of High Energy Physics, the Chinese Academy of Sciences, Beijing100049, China One design of multi-function LIGA beamline has been reported. In this design, two plane mirrors and a series of filters have been employed. One can choose the spectrum range of X-ray easily according to the exposure requirement by adjusting the grazing angle of mirrors and the thickness of filters. And the spot size in the horizontal direction is up to 120mm, which is large enough for exposing 5 inch silicon slice. The typical exposure time is about 1.2h, 1.8h, 0.5h, corresponding to PMMA thickness of 500μm, 200μm, 20μm, respectively. Synchrotron radiation Beamline Lithography electroforming micro molding X-ray lithography References ANKA Lithography Methods, Beamline: ANKA-Litho I, ANKA-Litho il, ANKA-Litho III . ANKA Lithography Methods, Beamline: ANKA-Litho I, ANKA-Litho il, ANKA-Litho III Pantenburg F J , Chlebek J , El-Kholi A , et al . Microelectronic Engineering , 1994 , 23 : 223 - 226 Microelectronic Engineering Yi F , Jin M , Tang E , et al . Microsystem Technologies , 1996 , 3 : 7 - 9 Microsystem Technologies Lehr H , Ehrfeld W . LIGA-Technique, An overview . The 6th Chinese International Summer School of Physics Application of Synchrotron Radiation, Lecture Notes , 23 - 46 LIGA-Technique, An overview 10.1016/S1001-8042(06)60003-1 TN42,TH73 2005-06-30 2006-02-20 2021-01-19 2006 Nuclear Science and Techniques 01 17