J. S. PAN; R. S. LIU; E. S. TOK

doi:10.1016/S1001-8042(06)60038-9

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Probing Co/Si interface behaviour by X-ray photoelectron spectroscopy (XPS) and atomic force microscopy (AFM)

LOW ENERGY ACCELERATOR, RAY TECHNOLOGY AND APPLICATIONS | 更新时间：2021-01-29

- Probing Co/Si interface behaviour by X-ray photoelectron spectroscopy (XPS) and atomic force microscopy (AFM) 封面论文增强出版
- Probing Co/Si interface behaviour by X-ray photoelectron spectroscopy (XPS) and atomic force microscopy (AFM)
- 核技术（英文版） 2006年 17卷第4期 (2006)
- 作者机构：
  
  Institute of Materials Research and Engineering, 3 Research Link,Singapore,117602;Department of Physics, National University of Singapore,Kent Ridge,Singapore,119260
- 作者简介：
- 基金信息：
- DOI：10.1016/S1001-8042(06)60038-9 中图分类号： TN304.2⁺4,TH744.11⁺2,TH742.9
- 纸质出版日期：2006-08-20，
  
  网络出版日期：，
  
  收稿日期：2006-07-20，
  
  修回日期：，
  
  录用日期：
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J. S. PAN, R. S. LIU, E. S. TOK. Probing Co/Si interface behaviour by X-ray photoelectron spectroscopy (XPS) and atomic force microscopy (AFM)[J]. 核技术（英文版）, 2006, 17(4):202-211.

J. S. PAN, R. S. LIU, E. S. TOK. Probing Co/Si interface behaviour by X-ray photoelectron spectroscopy (XPS) and atomic force microscopy (AFM)[J]. Nuclear Science and Techniques, 2006, 17(4):202-211.
J. S. PAN, R. S. LIU, E. S. TOK. Probing Co/Si interface behaviour by X-ray photoelectron spectroscopy (XPS) and atomic force microscopy (AFM)[J]. 核技术（英文版）, 2006, 17(4):202-211. DOI： 10.1016/S1001-8042(06)60038-9.

J. S. PAN, R. S. LIU, E. S. TOK. Probing Co/Si interface behaviour by X-ray photoelectron spectroscopy (XPS) and atomic force microscopy (AFM)[J]. Nuclear Science and Techniques, 2006, 17(4):202-211. DOI： 10.1016/S1001-8042(06)60038-9.

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Probing Co/Si interface behaviour by X-ray photoelectron spectroscopy (XPS) and atomic force microscopy (AFM) 封面论文 增强出版

Probing Co/Si interface behaviour by X-ray photoelectron spectroscopy (XPS) and atomic force microscopy (AFM) 封面论文增强出版