Your Location：

Home >

Browse articles >

Developments at SSRF in soft X-ray interference lithography

SYNCHROTRON RADIATION TECHNOLOGY AND APPLICATIONS | Updated：2021-01-20

- Developments at SSRF in soft X-ray interference lithography Cover Article Enhanced Publication
- Nuclear Science and Techniques Vol.26, Issue 1, (2015)
- Affiliations：
  
  Shanghai Institute of Applied Physics, Chinese Academy of Sciences, Shanghai Synchrotron Radiation Facility,Shanghai,China,201800
- Author bio：
- Funds：
- DOI：10.13538/j.1001-8042/nst.26.010101 CLC：
- Published：20 February 2015，
  
  Published Online：02 February 2015，
  
  Received：17 September 2014，
  
  Revised：，
  
  Accepted：14 November 2014
Scan the full text
Cite this article
Shu-Min YANG, Lian-Sheng WANG, Jun ZHAO, et al. Developments at SSRF in soft X-ray interference lithography. [J]. Nuclear Science and Techniques 26(1):010101(2015)
DOI：

Shu-Min YANG, Lian-Sheng WANG, Jun ZHAO, et al. Developments at SSRF in soft X-ray interference lithography. [J]. Nuclear Science and Techniques 26(1):010101(2015) DOI： 10.13538/j.1001-8042/nst.26.010101.

0

Views

1

Downloads

0

CSCD

Alert me when the article has been cited

Submit

Tools

Publicity Resources

Related Articles

No data

Related Author

No data

Related Institution

No data

⁰