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Bulk etch rates of CR-39 at high etchant concentrations: Diffusion-limited etching

NUCLEAR PHYSICS AND INTERDISCIPLINARY RESEARCH | Updated：2021-01-26

- Bulk etch rates of CR-39 at high etchant concentrations: Diffusion-limited etching Cover Article Enhanced Publication
- Nuclear Science and Techniques Vol.31, Issue 12, (2020)
- Affiliations：
  
  Physics Department, Faculty of Science, Menoufia University, Shebin El-Koom,Menoufia,Egypt,32511;KM Multan Road, P.O. Chung,Lahore,Pakistan;Department of Physics, College of Education for Pure Sciences, University of Mosul,Mosul,Iraq,41001
- Author bio：
- Funds：
- DOI：10.1007/s41365-020-00830-6 CLC：
- Published：01 December 2020，
  
  Published Online：04 December 2020，
  
  Received：18 August 2020，
  
  Revised：17 October 2020，
  
  Accepted：19 October 2020
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Cite this article
E.M. Awad, M.A. Rana, Mushtaq Abed Al-Jubbori. Bulk etch rates of CR-39 at high etchant concentrations: Diffusion-limited etching. [J]. Nuclear Science and Techniques 31(12):118(2020)
DOI：

E.M. Awad, M.A. Rana, Mushtaq Abed Al-Jubbori. Bulk etch rates of CR-39 at high etchant concentrations: Diffusion-limited etching. [J]. Nuclear Science and Techniques 31(12):118(2020) DOI： 10.1007/s41365-020-00830-6.

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Bulk etch rates of CR-39 at high etchant concentrations: Diffusion-limited etching Cover Article Enhanced Publication