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1.Physics Department, Faculty of Science, Menoufia University, Shebin El-Koom, Menoufia 32511, Egypt
2.MERADD, Instrumentation Control & Computer Complex (ICCC), PARAS Building, 18-KM Multan Road, P.O. Chung, Lahore, Pakistan
3.Department of Physics, College of Education for Pure Sciences, University of Mosul, 41001 Mosul, Iraq
Corresponding author e-mail: ushtaq_phy8@yahoo.com, mushtaq_phy@uomosul.edu.iq, mushtaqphy8@gmail.com
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Published:01 December 2020,
Published Online:04 December 2020,
Received:18 August 2020,
Revised:17 October 2020,
Accepted:19 October 2020
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Cite this article
E.M. Awad, M.A. Rana, Mushtaq Abed Al-Jubbori. Bulk etch rates of CR-39 at high etchant concentrations: Diffusion-limited etching. [J]. Nuclear Science and Techniques 31(12):118(2020)
E.M. Awad, M.A. Rana, Mushtaq Abed Al-Jubbori. Bulk etch rates of CR-39 at high etchant concentrations: Diffusion-limited etching. [J]. Nuclear Science and Techniques 31(12):118(2020) DOI: 10.1007/s41365-020-00830-6.
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