E.M. Awad; M.A. Rana; Mushtaq Abed Al-Jubbori

doi:10.1007/s41365-020-00830-6

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Bulk etch rates of CR-39 at high etchant concentrations: Diffusion-limited etching

NUCLEAR PHYSICS AND INTERDISCIPLINARY RESEARCH | 更新时间：2021-01-26

- Bulk etch rates of CR-39 at high etchant concentrations: Diffusion-limited etching 封面论文增强出版
- Bulk etch rates of CR-39 at high etchant concentrations: Diffusion-limited etching
- 核技术（英文版） 2020年 31卷第12期 (2020)
- 作者机构：
  
  Physics Department, Faculty of Science, Menoufia University, Shebin El-Koom,Menoufia,Egypt,32511;KM Multan Road, P.O. Chung,Lahore,Pakistan;Department of Physics, College of Education for Pure Sciences, University of Mosul,Mosul,Iraq,41001
- 作者简介：
- 基金信息：
- DOI：10.1007/s41365-020-00830-6 中图分类号：
- 纸质出版日期：2020-12-01，
  
  网络出版日期：2020-12-04，
  
  收稿日期：2020-08-18，
  
  修回日期：2020-10-17，
  
  录用日期：2020-10-19
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引用本文
E.M. Awad, M.A. Rana, Mushtaq Abed Al-Jubbori. Bulk etch rates of CR-39 at high etchant concentrations: Diffusion-limited etching[J]. 核技术（英文版）, 2020, 31(12):118

E.M. Awad, M.A. Rana, Mushtaq Abed Al-Jubbori. Bulk etch rates of CR-39 at high etchant concentrations: Diffusion-limited etching[J]. Nuclear Science and Techniques, 2020, 31(12):118
E.M. Awad, M.A. Rana, Mushtaq Abed Al-Jubbori. Bulk etch rates of CR-39 at high etchant concentrations: Diffusion-limited etching[J]. 核技术（英文版）, 2020, 31(12):118 DOI： 10.1007/s41365-020-00830-6.

E.M. Awad, M.A. Rana, Mushtaq Abed Al-Jubbori. Bulk etch rates of CR-39 at high etchant concentrations: Diffusion-limited etching[J]. Nuclear Science and Techniques, 2020, 31(12):118 DOI： 10.1007/s41365-020-00830-6.

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Bulk etch rates of CR-39 at high etchant concentrations: Diffusion-limited etching 封面论文 增强出版

Bulk etch rates of CR-39 at high etchant concentrations: Diffusion-limited etching 封面论文增强出版