1.Division of Interfacial Water and Key Laboratory of Interfacial Physics and Technology, Shanghai Institute of Applied Physics, Chinese Academy of Sciences, Shanghai 201800, China.
2.University of Chinese Academy of Sciences, Beijing 100049, China
3.School of Electronic Engineering, Chengdu Technological University, Chengdu 611730, China
Corresponding author. E-mail: wangchunlei@sinap.ac.cn
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纸质出版日期:2018-02-01,
网络出版日期:2018-01-25,
收稿日期:2017-09-23,
修回日期:2017-11-20,
录用日期:2017-12-04
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Xue-Chuan Nie, Bo Zhou, Chun-Lei Wang, 等. Wetting behaviors of methanol, ethanol, and propanol on hydroxylated SiO2 substrate[J]. 核技术(英文版), 2018, 29(2):18
Xue-Chuan Nie, Bo Zhou, Chun-Lei Wang, et al. Wetting behaviors of methanol, ethanol, and propanol on hydroxylated SiO2 substrate[J]. Nuclear Science and Techniques, 2018, 29(2):18
Xue-Chuan Nie, Bo Zhou, Chun-Lei Wang, 等. Wetting behaviors of methanol, ethanol, and propanol on hydroxylated SiO2 substrate[J]. 核技术(英文版), 2018, 29(2):18 DOI: 10.1007/s41365-018-0364-6.
Xue-Chuan Nie, Bo Zhou, Chun-Lei Wang, et al. Wetting behaviors of methanol, ethanol, and propanol on hydroxylated SiO2 substrate[J]. Nuclear Science and Techniques, 2018, 29(2):18 DOI: 10.1007/s41365-018-0364-6.
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