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Research on deposition rate of TiZrV/Pd film by DC magnetron sputtering method

NUCLEAR CHEMISTRY, RADIOCHEMISTRY, RADIOPHARMACEUTICALS AND NUCLEAR MEDICINE | 更新时间：2021-02-23

- Research on deposition rate of TiZrV/Pd film by DC magnetron sputtering method 封面论文增强出版
- Research on deposition rate of TiZrV/Pd film by DC magnetron sputtering method
- 核技术（英文版） 2017年 28卷第4期 (2017)
- 作者机构：
  
  National Synchrotron Radiation Laboratory, University of Science and Technology of China,Hefei,China,230029
- 作者简介：
- 基金信息：
  
  National Natural Science Funds of China;Fundamental Research Funds for the Central Universities
- DOI：10.1007/s41365-017-0199-6 中图分类号：
- 纸质出版日期：2017-04-01，
  
  网络出版日期：2017-03-01，
  
  收稿日期：2015-09-24，
  
  修回日期：2015-11-23，
  
  录用日期：2015-12-08
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引用本文
Jie Wang, Bo Zhang, Yan-Hui Xu, 等. Research on deposition rate of TiZrV/Pd film by DC magnetron sputtering method[J]. 核技术（英文版）, 2017, 28(4):50

Jie Wang, Bo Zhang, Yan-Hui Xu, et al. Research on deposition rate of TiZrV/Pd film by DC magnetron sputtering method[J]. Nuclear Science and Techniques, 2017, 28(4):50
Jie Wang, Bo Zhang, Yan-Hui Xu, 等. Research on deposition rate of TiZrV/Pd film by DC magnetron sputtering method[J]. 核技术（英文版）, 2017, 28(4):50 DOI： 10.1007/s41365-017-0199-6.

Jie Wang, Bo Zhang, Yan-Hui Xu, et al. Research on deposition rate of TiZrV/Pd film by DC magnetron sputtering method[J]. Nuclear Science and Techniques, 2017, 28(4):50 DOI： 10.1007/s41365-017-0199-6.

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Research on deposition rate of TiZrV/Pd film by DC magnetron sputtering method 封面论文 增强出版

Research on deposition rate of TiZrV/Pd film by DC magnetron sputtering method 封面论文增强出版