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Cleaning of carbon contaminated optics using O₂/Ar plasma

SYNCHROTRON RADIATION TECHNOLOGY AND APPLICATIONS | 更新时间：2021-02-23

- Cleaning of carbon contaminated optics using O₂/Ar plasma 封面论文增强出版
- Cleaning of carbon contaminated optics using O₂/Ar plasma
- 核技术（英文版） 2017年 28卷第9期 (2017)
- 作者机构：
  
  Shanghai Institute of Applied Physics, Chinese Academy of Sciences,Shanghai,China,201204
- 作者简介：
- 基金信息：
  
  Maintenance and Renovation Project of Large Scale Scientific Facility, Chinese Academy of Sciences()
- DOI：10.1007/s41365-017-0274-z 中图分类号：
- 纸质出版日期：2017-09-01，
  
  网络出版日期：2017-08-05，
  
  收稿日期：2016-10-21，
  
  修回日期：2017-04-12，
  
  录用日期：2017-04-16
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引用本文
Yi-Fei Zhang, Hong-Xin Luo, Zhi GUO, 等. Cleaning of carbon contaminated optics using O₂/Ar plasma[J]. 核技术（英文版）, 2017, 28(9):127

Yi-Fei Zhang, Hong-Xin Luo, Zhi GUO, et al. Cleaning of carbon contaminated optics using O₂/Ar plasma[J]. Nuclear Science and Techniques, 2017, 28(9):127
Yi-Fei Zhang, Hong-Xin Luo, Zhi GUO, 等. Cleaning of carbon contaminated optics using O₂/Ar plasma[J]. 核技术（英文版）, 2017, 28(9):127 DOI： 10.1007/s41365-017-0274-z.

Yi-Fei Zhang, Hong-Xin Luo, Zhi GUO, et al. Cleaning of carbon contaminated optics using O₂/Ar plasma[J]. Nuclear Science and Techniques, 2017, 28(9):127 DOI： 10.1007/s41365-017-0274-z.

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