Developments at SSRF in soft X-ray interference lithography

Shu-Min YANG; Lian-Sheng WANG; Jun ZHAO; Chao-Fan XUE; Hai-Gang LIU; Zi-Jian XU; Yan-Qing WU; Ren-Zhong TAI

doi:10.13538/j.1001-8042/nst.26.010101

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Developments at SSRF in soft X-ray interference lithography

SYNCHROTRON RADIATION TECHNOLOGY AND APPLICATIONS | Updated：2021-01-20

- Developments at SSRF in soft X-ray interference lithography
- Nuclear Science and Techniques Vol. 26, Issue 1, Article number: 010101(2015)
- Affiliations：
  
  1.Shanghai Institute of Applied Physics, Chinese Academy of Sciences, Shanghai Synchrotron Radiation Facility, Shanghai 201800, China
- Author bio：
  
  Corresponding author, wuyanqing@sinap.ac.cn
  Corresponding author, tairenzhong@sinap.ac.cn
- Funds：
- DOI：10.13538/j.1001-8042/nst.26.010101
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Shu-Min YANG, Lian-Sheng WANG, Jun ZHAO, et al. Developments at SSRF in soft X-ray interference lithography. [J]. Nuclear Science and Techniques 26(1):010101(2015)
DOI：

Shu-Min YANG, Lian-Sheng WANG, Jun ZHAO, et al. Developments at SSRF in soft X-ray interference lithography. [J]. Nuclear Science and Techniques 26(1):010101(2015) DOI： 10.13538/j.1001-8042/nst.26.010101.

摘要

Abstract

The soft X-ray interference lithography (XIL) branch beamline at Shanghai Synchrotron Radiation Facility (SSRF) is briefly introduced in this article. It is designed for obtaining 1D (line/space) and 2D (dot/hole) periodic nanostructures by using two or more coherent extreme ultraviolet (EUV) beams from an undulator source. A transmission-diffraction-grating type of interferometer is used at the end station. Initial results reveal high performance of the beamline, with 50 nm half-pitch 1D and 2D patterns from a single exposure area of 400 μm×400 μm. XIL is used in a growing number of areas, such as EUV resist test, surface enhanced Raman scattering (SERS) and color filter plasmonic devices. By using highly coherent EUV beam, broadband coherent diffractive imaging can be performed on the XIL beamline. Well reconstructed pinhole of ,ϕ,20 μm has been realized.

关键词

Keywords

Extreme ultravioletSoft x-ray interference lithographyPeriodic nanostructuresGratingHalf-pitch

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