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CrN films deposited by ion source-assisted magnetron sputtering

LOW ENERGY ACCELERATORS AND RADIATION APPLICATIONS | Updated：2021-01-29

- CrN films deposited by ion source-assisted magnetron sputtering Cover Article Enhanced Publication
- Nuclear Science and Techniques Vol.21, Issue 5, (2010)
- Affiliations：
  
  Key Laboratory of Artificial micro- and nano-Materials of Ministry of Education and School of Physics and Technology, Wuhan University,Wuhan,China,430072;School of Power and Mechanical Engineering, Wuhan University,Wuhan,China,430072
- Author bio：
- Funds：
- DOI：10.13538/j.1001-8042/nst.21.289-293 CLC：
- Published：20 October 2010，
  
  Published Online：，
  
  Received：24 June 2010，
  
  Revised：，
  
  Accepted：
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Cite this article
Chuansheng LIU, Canxin TIAN, Ming LI, et al. CrN films deposited by ion source-assisted magnetron sputtering. [J]. Nuclear Science and Techniques 21(5):289-293(2010)
DOI：

Chuansheng LIU, Canxin TIAN, Ming LI, et al. CrN films deposited by ion source-assisted magnetron sputtering. [J]. Nuclear Science and Techniques 21(5):289-293(2010) DOI： 10.13538/j.1001-8042/nst.21.289-293.

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CrN films deposited by ion source-assisted magnetron sputtering Cover Article Enhanced Publication