CrN films deposited by ion source-assisted magnetron sputtering

CrN films deposited by ion source-assisted magnetron sputtering 1 first-author 1 1 1 1 2 1 1 corresp Corresponding Author, E-mail adderss: djfu@whu.edu.cn Corresponding Author, E-mail adderss: djfu@whu.edu.cn djfu@whu.edu.cn Key Laboratory of Artificial micro- and nano-Materials of Ministry of Education and School of Physics and Technology, Wuhan University, 430072 Wuhan, China Key Laboratory of Artificial micro- and nano-Materials of Ministry of Education and School of Physics and Technology, Wuhan University, 430072 Wuhan, China School of Power and Mechanical Engineering, Wuhan University, 430072 Wuhan, China School of Power and Mechanical Engineering, Wuhan University, 430072 Wuhan, China CrN coatings were deposited on Si(100) and piston rings by ion source assisted 40 kHz magnetron sputtering. Structure and composition of the coatings were characterized by X-ray diffraction, atomic force microscopy, scanning electron microscopy and transmission electron microscopy. Mechanical and tribological properties were assessed by microhardness and pin-on-disc testing. The ion source-assisted system has a deposition rate of 3.88 μm/h, against 2.2 μm/h without ion-source assistance. The CrN coatings prepared with ion source assistance exhibited an increase in microhardness (up to 16.3 GPa) and decrease in friction coefficient (down to 0.48) at the optimized cathode source-to-substrate distance. Under optimized conditions, CrN coatings were deposited on piston rings, with a thickness of 25 μm and hardness of 17.85 GPa. CrN Cathode source-substrate distance Ion source Deposition rate Microhardness Friction coefficient References He X M , Baker N , Kehler B A , et al . J Vac Sci Technol A , 2000 , 18 : 30 J Vac Sci Technol A Olaya J J , Rodil S E , Muhl S , et al . Thin Solid Films , 2005 , 474 : 11 - 9 . Thin Solid Films Zhang G A , Yan P X , Wang P , et al . Mater Sci Engineer A , 2007 , 301 : 460 - 461 . Mater Sci Engineer A Mayrhofer P H , Willmann H , Mitterer C . Surf Coat Technol , 2001 , 222 : 146 - 147 . Surf Coat Technol Warcholinski B , Gilewicz A , Kuklinski Z , et al . Vacuum , 2009 , 83 : 715 - 718 . Vacuum Oner C , Hazar H , Nursoy M . Mater Design , 2009 , 30 : 914 Mater Design Shin S H , Kim M W , Kang M C , et al . Surf Coat Technol , 2008 , 202 : 5613 - 5616 . Surf Coat Technol Ney A , Rajaram R , Parkin S S P , et al . Appl Phys Lett , 2006 , 89 : 112504 - 6 . Appl Phys Lett Feng W J , Li D , Li W F , et al . J Alloy Compd , 2006 , 425 : 4 - 9 . J Alloy Compd Yu X , Wang C B , Liu Y , et al . Plasma Sci, Technol , 2006 , 8 : 337 . Plasma Sci, Technol Li G Q , Liu C , Li J F , et al . Surf Coat Technol , 2005 , 193 : 112 . Surf Coat Technol Wei R H , Vajo J J , Matossian J N , et al . Surf Coat Technol , 2002 , 465 : 158 - 159 . Surf Coat Technol Wei R H . Surf Coat Technol , 2008 , 203 : 538 - 544 . Surf Coat Technol Wei R H , Lang E , Rincon C . Arps J H, Surf Coat Technol , 2006 , 201 : 4453 . Arps J H, Surf Coat Technol 10.13538/j.1001-8042/nst.21.289-293 Supported by the Ministry of Industry and Information Technology (No. 2009ZX04012-032) . 2010-06-24 2010-10-20 2021-01-19 2010 Nuclear Science and Techniques 05 21