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Probing Co/Si interface behaviour by X-ray photoelectron spectroscopy (XPS) and atomic force microscopy (AFM)

LOW ENERGY ACCELERATOR, RAY TECHNOLOGY AND APPLICATIONS | Updated：2021-01-29

- Probing Co/Si interface behaviour by X-ray photoelectron spectroscopy (XPS) and atomic force microscopy (AFM) Cover Article Enhanced Publication
- Nuclear Science and Techniques Vol.17, Issue 4, (2006)
- Affiliations：
  
  Institute of Materials Research and Engineering, 3 Research Link,Singapore,117602;Department of Physics, National University of Singapore,Kent Ridge,Singapore,119260
- Author bio：
- Funds：
- DOI：10.1016/S1001-8042(06)60038-9 CLC： TN304.2⁺4,TH744.11⁺2,TH742.9
- Published：20 August 2006，
  
  Published Online：，
  
  Received：20 July 2006，
  
  Revised：，
  
  Accepted：
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Cite this article
J. S. PAN, R. S. LIU, E. S. TOK. Probing Co/Si interface behaviour by X-ray photoelectron spectroscopy (XPS) and atomic force microscopy (AFM). [J]. Nuclear Science and Techniques 17(4):202-211(2006)
DOI：

J. S. PAN, R. S. LIU, E. S. TOK. Probing Co/Si interface behaviour by X-ray photoelectron spectroscopy (XPS) and atomic force microscopy (AFM). [J]. Nuclear Science and Techniques 17(4):202-211(2006) DOI： 10.1016/S1001-8042(06)60038-9.

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Probing Co/Si interface behaviour by X-ray photoelectron spectroscopy (XPS) and atomic force microscopy (AFM) Cover Article Enhanced Publication