A COMPUTER SIMULATION OF HIGH-DOSE ION IMPLANTATION INTO AMORPHOUS MATERIALS

A COMPUTER SIMULATION OF HIGH-DOSE ION IMPLANTATION INTO AMORPHOUS MATERIALS 1 first-author 1 Peking University, Beijing 100871, China Peking University, Beijing 100871, China A computer program MACA was developed for simulating high - dose ion implantation into amorphous solids. The topology of amorphous solids was modelled by adjusting the free flight path distribution between collisions, so that the radial distribution function will characterize the short - range order and long - range disorder of amorphous targets. A simulation example is given. Simulation of high-dose ion implantation Amorphous target topology modelling MACA code REFERENCES R. Zallen , The physics of amorphous solids , John Wiley & Sons, Inc. , 1983 . The physics of amorphous solids J.F. Ziegler et al ., The stopping and range of ions in solids , Pergamon Press , 1985 . The stopping and range of ions in solids 1990-05-01 2021-02-05 1990 Nuclear Science and Techniques 1-2 1