Behaviors of optical and chemical state of Nb⁺ implanted sapphire after annealing

Behaviors of optical and chemical state of Nb + implanted sapphire after annealing 1 first-author 1 Key Laboratory for Radiation Physics and Technology of Education Ministry of China, Institute of Nuclear Science and Technology, Sichuan University, Chengdu 610064 Key Laboratory for Radiation Physics and Technology of Education Ministry of China, Institute of Nuclear Science and Technology, Sichuan University, Chengdu 610064 The behavior of the radiation damage of sapphire crystal, produced by implantation with 380 keV Nb + ion followed by annealing in a series of steps from 500 to 1100°C at reducing atmosphere, was investigated in optical absorption and XPS measurements. It is found that the implanted niobium in sapphire is in different local environments with different chemical states after the annealing. The changes in optical density (OD) from the bands, based on the well known F-type centers, show that the annealing behavior of the radiation damage may be divided into different stages due to different mechanisms. Sapphire crystal Implantation Radiation damage References Kelly R . Nucl Instr Meth , 1981 , 182/183 : 351 Nucl Instr Meth Ramos S M M , Canut B , Gea L et al . Nucl Instr Meth , 1991 , B59/60 : 1201 Nucl Instr Meth Huang N K , Neubeck K , Yamamoto S et al . Phys Stat Sol (a) , 1998 , 165 : 367 Phys Stat Sol (a) Evans B D , Stapellbrock M . Phys Rev , 1978 , B18 : 7089 , 1987 , 4 : 1709 Phys Rev Brewer J D , Jeffries B T , Summers G P . Phys Rev , 1980 , B22 : 4900 Phys Rev Pogatshnik G J , Chen Y , Evans B D . IEEE Trans Nucl Sci , 1987 , 34 : 1709 IEEE Trans Nucl Sci Averback B S , Enrhardt P , Popov A I et al . Radiat Eff Def Solids , 1995 , 136 : 169 Radiat Eff Def Solids Mchargue C J , Skiad P S , White C W et al . J Mater Res , 1991 , 6 : 214 J Mater Res Choudhury T , Saillat S O , Sullivan J L et al . J Phys D: Appl Phys , 1989 , 22 : 1185 J Phys D: Appl Phys Fontaine R , Caillat R , Feve L et al . J Electron Spectrosc Relat Phenom , 1997 , 10 : 349 J Electron Spectrosc Relat Phenom Huang N K , Tsuchiya B , Neubeck K et al . Nucl Instr Meth , 1998 , B143 : 479 Nucl Instr Meth O571.33, O482.3, O483 1999-11-08 2000-05-01 2021-02-05 2000 Nuclear Science and Techniques 2 11