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Kinetic study of wet oxidation of Si_0.5Ge_0.5 alloy by Rutherford backscattering spectroscopy

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- Kinetic study of wet oxidation of Si_0.5Ge_0.5 alloy by Rutherford backscattering spectroscopy Cover Article Enhanced Publication
- Nuclear Science and Techniques Vol.11, Issue 2, (2000)
- Affiliations：
  
  Institute of Semiconductors, Shandong Normal University,Jinan,250014;Laboratory of Nuclear Analysis Technology, Shanghai Institute of Nuclear Research, the Chinese Academy of Sciences,Shanghai,201800
- Author bio：
- Funds：
- DOI： CLC： TN305.5, O571.33, O485,
- Published：01 May 2000，
  
  Published Online：，
  
  Received：08 December 1999，
  
  Revised：，
  
  Accepted：
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Jing-Ping ZHANG, Chang-Chun CHEN, Jing-Hua LIU, et al. Kinetic study of wet oxidation of Si_0.5Ge_0.5 alloy by Rutherford backscattering spectroscopy. [J]. Nuclear Science and Techniques 11(2):114-118(2000)
DOI：

Jing-Ping ZHANG, Chang-Chun CHEN, Jing-Hua LIU, et al. Kinetic study of wet oxidation of Si_0.5Ge_0.5 alloy by Rutherford backscattering spectroscopy. [J]. Nuclear Science and Techniques 11(2):114-118(2000) DOI：

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