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Research on deposition rate of TiZrV/Pd film by DC magnetron sputtering method

NUCLEAR CHEMISTRY, RADIOCHEMISTRY, RADIOPHARMACEUTICALS AND NUCLEAR MEDICINE | Updated：2021-02-23

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- Research on deposition rate of TiZrV/Pd film by DC magnetron sputtering method Cover Article Enhanced Publication
- Nuclear Science and Techniques Vol.28, Issue 4, (2017)
- Affiliations：
  
  National Synchrotron Radiation Laboratory, University of Science and Technology of China,Hefei,China,230029
- Author bio：
- Funds：
- DOI：10.1007/s41365-017-0199-6 CLC：
- Published：01 April 2017，
  
  Published Online：01 March 2017，
  
  Received：24 September 2015，
  
  Revised：23 November 2015，
  
  Accepted：08 December 2015
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Cite this article
Jie Wang, Bo Zhang, Yan-Hui Xu, et al. Research on deposition rate of TiZrV/Pd film by DC magnetron sputtering method. [J]. Nuclear Science and Techniques 28(4):50(2017)
DOI：

Jie Wang, Bo Zhang, Yan-Hui Xu, et al. Research on deposition rate of TiZrV/Pd film by DC magnetron sputtering method. [J]. Nuclear Science and Techniques 28(4):50(2017) DOI： 10.1007/s41365-017-0199-6.

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