Bulk etch rates of CR-39 at high etchant concentrations: Diffusion-limited etching

E.M. Awad; M.A. Rana; Mushtaq Abed Al-Jubbori

doi:10.1007/s41365-020-00830-6

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Bulk etch rates of CR-39 at high etchant concentrations: Diffusion-limited etching

NUCLEAR PHYSICS AND INTERDISCIPLINARY RESEARCH | Updated：2021-01-26

- Bulk etch rates of CR-39 at high etchant concentrations: Diffusion-limited etching
- Bulk etch rates of CR-39 at high etchant concentrations: Diffusion-limited etching
- 核技术（英文版） 2020年31卷第12期文章编号：118
- Affiliations：
  
  1.Physics Department, Faculty of Science, Menoufia University, Shebin El-Koom, Menoufia 32511, Egypt
  2.MERADD, Instrumentation Control & Computer Complex (ICCC), PARAS Building, 18-KM Multan Road, P.O. Chung, Lahore, Pakistan
  3.Department of Physics, College of Education for Pure Sciences, University of Mosul, 41001 Mosul, Iraq
- Author bio：
  
  Corresponding author e-mail: ushtaq_phy8@yahoo.com, mushtaq_phy@uomosul.edu.iq, mushtaqphy8@gmail.com
- Funds：
- DOI：10.1007/s41365-020-00830-6
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E.M. Awad, M.A. Rana, Mushtaq Abed Al-Jubbori. Bulk etch rates of CR-39 at high etchant concentrations: Diffusion-limited etching[J]. 核技术（英文版）, 2020,31(12):118

E.M. Awad, M.A. Rana, Mushtaq Abed Al-Jubbori. Bulk etch rates of CR-39 at high etchant concentrations: Diffusion-limited etching[J]. Nuclear Science and Techniques, 2020,31(12):118
E.M. Awad, M.A. Rana, Mushtaq Abed Al-Jubbori. Bulk etch rates of CR-39 at high etchant concentrations: Diffusion-limited etching[J]. 核技术（英文版）, 2020,31(12):118 DOI： 10.1007/s41365-020-00830-6.

E.M. Awad, M.A. Rana, Mushtaq Abed Al-Jubbori. Bulk etch rates of CR-39 at high etchant concentrations: Diffusion-limited etching[J]. Nuclear Science and Techniques, 2020,31(12):118 DOI： 10.1007/s41365-020-00830-6.

摘要

Abstract

Systematic CR-39 bulk etching experiments were conducted over a wide range of concentrations (2-30 N) of NaOH based etchant. Critical analysis and a deep discussion of the results are presented. A comprehensive nuclear track chemical etching data bank was developed. Three regimes of CR-39 bulk etching were identified. Regime I spans etchant concentrations from 2 to 12 N. Regime II spans concentrations from 12 to 25 N. We call this the dynamic bulk etching regime. Regime III is for concentrations greater than 25 N. In this regime, the bulk etch rate is saturated with respect to the etchant concentration. This classification is discussed and explained. The role of ethanol in NaOH-based etchants is explored and discussed. A parameter called the "reduced bulk etch rate" is defined here, which helps in analyzing the dependence of bulk etching on the amount of ethanol in the etchant. The bulk etch rate shows a natural logarithmic dependence on the density of ethanol in the etchant.

关键词

Keywords

CR-39 detectorEthanolBulk etch rateReduced bulk etch rateDiffusion-limited etchingConcentration-limited etching

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