A compact electron storage ring for lithographical applications

Si-Qi Shen; Da-Zhang Huang; Zhen-Tang Zhao; Qing-Lei Zhang

doi:10.1007/s41365-021-00924-9

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A compact electron storage ring for lithographical applications

SYNCHROTRON RADIATION TECHNOLOGY AND APPLICATIONS | Updated：2021-09-30

- A compact electron storage ring for lithographical applications
- A compact electron storage ring for lithographical applications
- 核技术（英文版） 2021年32卷第9期文章编号：91
- Affiliations：
  
  1.Shanghai Institute of Applied Physics, Chinese Academy of Sciences, Shanghai 201800, China
  2.University of Chinese Academy of Sciences, Beijing 100049, China
  3.Shanghai Advanced Research Institute, Chinese Academy of Sciences, Shanghai 201204, China
- Author bio：
  
  Da-Zhang Huang huangdazhang@zjlab.org.cn
- Funds：
  
  National Key Research and Development Program of China(2016YFA0401901);National Natural Science Foundation of China(11675248)
- DOI：10.1007/s41365-021-00924-9
  中图分类号：
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A compact electron storage ring for lithographical applications[J]. 核技术（英文版）, 2021,32(9):91

Si-Qi Shen, Da-Zhang Huang, Zhen-Tang Zhao, et al. A compact electron storage ring for lithographical applications[J]. Nuclear Science and Techniques, 2021,32(9):91
A compact electron storage ring for lithographical applications[J]. 核技术（英文版）, 2021,32(9):91 DOI： 10.1007/s41365-021-00924-9.

Si-Qi Shen, Da-Zhang Huang, Zhen-Tang Zhao, et al. A compact electron storage ring for lithographical applications[J]. Nuclear Science and Techniques, 2021,32(9):91 DOI： 10.1007/s41365-021-00924-9.

摘要

Abstract

The physical design for a novel low-energy compact-storage-ring-based extreme ultraviolet (EUV) light source was systemically studied. The design process considers the linear and nonlinear beam optics, including transverse matching and the optimization of the dynamic aperture, momentum aperture, and beam lifetime. With a total circumference of 36.7 m and a beam energy of 400 MeV, the storage ring can operate with an average beam current of up to 1 A. With the undulator as the radiator, this facility has the potential to emit EUV radiation at 13.5 nm with an average power exceeding 10 W within the bandwidth. In addition, the collective instabilities of the lattice at high beam current were analyzed; it was found that the typical instabilities which may occur in an electron storage ring can be reasonably controlled in our design. With the advantages of variable beam energy and current, this design exhibits great promise as a new candidate for various extreme ultraviolet (EUV) lithographical applications requiring tunable radiation power.

关键词

Keywords

Storage ringExtreme ultraviolet (EUV)EUV Lithography (EUVL)

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