CrN films deposited by ion source-assisted magnetron sputtering

LOW ENERGY ACCELERATORS AND RADIATION APPLICATIONS

CrN films deposited by ion source-assisted magnetron sputtering

LIU Chuansheng，

TIAN Canxin，

LI Ming，

HE Jun，

YANG HuiJuan，

YANG Bing，

WANG Hong Jun，

FU Dejun

Nuclear Science and Techniques

Vol.21, No.5

pp.289-293

Published in print 20 Oct 2010

DOI：10.13538/j.1001-8042/nst.21.289-293

34500

CrN coatings were deposited on Si(100) and piston rings by ion source assisted 40 kHz magnetron sputtering. Structure and composition of the coatings were characterized by X-ray diffraction, atomic force microscopy, scanning electron microscopy and transmission electron microscopy. Mechanical and tribological properties were assessed by microhardness and pin-on-disc testing. The ion source-assisted system has a deposition rate of 3.88 μm/h, against 2.2 μm/h without ion-source assistance. The CrN coatings prepared with ion source assistance exhibited an increase in microhardness (up to 16.3 GPa) and decrease in friction coefficient (down to 0.48) at the optimized cathode source-to-substrate distance. Under optimized conditions, CrN coatings were deposited on piston rings, with a thickness of 25 μm and hardness of 17.85 GPa.

CrNCathode source-substrate distanceIon sourceDeposition rateMicrohardnessFriction coefficient

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