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Analysis of surface damage produced by pulsed laser ablation on metal Al and semiconductor Si

Analysis of surface damage produced by pulsed laser ablation on metal Al and semiconductor Si

Man Bao-Yuan
Liu Ai-Hua
Wang Xiang-Tai
Nuclear Science and TechniquesVol.9, No.2pp.98-101Published in print 01 May 1998
44900

The surface morphological changes produced by Nd: YAG pulsed laser ablation of metal Al and semiconductor Si were carefully examined and analyzed by using scanning electron microscope. The formation mechanism of the droplets was discussed, and the reasons for formation of the micro cracks on the laser irradiated area of the target surface were analyzed by calculating the thermal stress, the vapor pressure and the shock pressure induced by the laser supported detonation.

Laser damageThermal stressShock pressure
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