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Penetration depth and concentration distribution for implanted heavy ions with low energies in plant seeds by SEM and EDS

Penetration depth and concentration distribution for implanted heavy ions with low energies in plant seeds by SEM and EDS

WANG Xin-Fu
ZHOU Yun-Long
ZHOU Hong-Yu
LU Ting
Wang Chao
SU Ying
ZHU Guang-Hua
WEN Chen-Lin
LI Yong-Liang
Nuclear Science and TechniquesVol.12, No.1pp.21-25Published in print 01 Feb 2001
20500

The penetration depth and concentration distribution of implanted ions have been studied for low energy heavy ions implanted in the dry seeds of plant, such as peanut, mung bean, sunflower, wheat and radish seeds, etc. by SEM+EDS. The results show that the maximum penetration depth is about 12µm for V+ with an energy 200 keV implanted in cotyledon of the peanut, 18µm, 5µm, 20µm for V2+ with 90keV implanted in sunflower, wheat, radish seeds, respectively. The penetration depth of implanted Cu2+ with 80 keV is about 90µm in the remainder funicle derivative of the mung bean seeds. The experimental result of the maximum penetration depth of implanted V+ in the peanut seeds was compared with the calculated value of the TRIM95.

Ion implantation with low energyPenetration depthConcentration distributionDry seedCalculated values by TRIM95
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