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POLYMER DIODES MADE OF ION IMPLANTED POLYACETYLENE FILMS

POLYMER DIODES MADE OF ION IMPLANTED POLYACETYLENE FILMS

Sheng Kanglong
Bao Jinrong
Rong Tingwen
Lin Senhao
Wang Wenmin
Wan Honghe
Zou Zhiyi
Zhu Xinfang
Nuclear Science and TechniquesVol.1, No.4pp.193-197Published in print 01 Nov 1990
23900

Polyacetylene films were doped with FeCl3 and implanted with 30 keV K+ ions. Physical changes to the films were examined by a series of measurements, which include the four-probe test, infrared ray absorption and 2 MeV He+ particle elastic recoil dettection and Rutherford backscattering. The chemical dopants (Fe+++ and Cl-) were redistributed after the implantation and the different species (K+, Fe+++ and Cl- ions) formed p-n junctions at the implantation depths. The implanted films exhibited desirable I - V characteristics, with current densities as high as 600 mA/cm- at 3V and back - to - forward ratio of current over 300. The polymer diodes kept their behavior for over 60 days. Discussions on the results were given in detail.

Ion implantationDopant depth profilingPolyacetylene diodes
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