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Blistering and flaking of amorphous alloys bombarded with He ions

Blistering and flaking of amorphous alloys bombarded with He ions

HOU Ming-Dong
LIU Jie
ZHANG Qing-Xiang
LIU Gang
Nuclear Science and TechniquesVol.12, No.2pp.117-125Published in print 01 May 2001
26000

The blistering and flaking behavior of many kinds of amorphous alloys under helium ion bombardment at room temperature was investigated. Helium ions with energies of 40 keV and 60keV were implanted within the fluence range (1.0~4.0)×1018 ions/cm2. The surface topography of samples after irradiation was observed by using a scanning electron microscope. The diameter of blister and the thickness of exfoliated blister lids were measured. The results showed that many kinds of surface topography characteristics appeared for different fluences, energies and amorphous alloys, such as flaking, blistering, exfoliation, blister rupture, secondgeneration blistering and porous structure. The dependence of surface damage modes and the critical fluence for the onset of blistering and flaking on the sort of materials and ion energy was discussed.

BlisteringFlakingExfoliationHelium ion implantationAmorphous alloy
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