The design of a small complex-type focussed magnetron with a long target-life used for excited multi-atoms beam film deposition in hard coatings is described. The magnetron tunnel of the magnetron source was constructed by a planar unbalanced magnetic annulus, which comes from the extended co-axial magnetron principle and inside cylindrical magnet tunnel. The use efficiency of inside circular cone sputtering target area is high up to 62%. The inside-inversion cone sputtering target has a long life and results in a higher deposition rate 35 nm/min for Ti at a 2.5 Pa Ar pressure. A better focussing direction of ejecting atom beam has been achieved, and the arc power input is 300W for Ti target.