THE STUDIES OF SURFACE LAYER ATOMIC STRUCTURE OF AL(100) BY MEV ION SCATTERING

Cheng Huansheng，

Cui Zhixiang，

Xu Hongjie，

Yao Xiaowei，

Yang Fujia

Nuclear Science and Techniques

Vol.1, No.1-2

pp.105-112

Published in print 01 May 1990

27600

A UHV system specially designed for studying surface and interface atomic structure by MeV ion scattering and channeling is described. The vacuum in the UHV chamber is 133.332×10^-10Pa. The chamber is equipped with an ion gun used for sample cleaning, a translatable four-grid LEED-Auger system used for characterization of the crystal surface, and a three dimensional goniometer. The crystal preparation and cleaning procedure of Al(100) are presented. The surface peak intensity of Al(100)-< 100> and Al(100)- <100> has been measured by MeV ion channeling and scattering. The measured surface peak intensity was compared with that of Monte-Carlo simulation. The experimental results indicate that the thermal vibration amplitude of Al(100) surface atoms is 1.2-1.3 times that of bulk atoms. The relaxation of first layer for Al(100) is less than -0.005nm.

MeV ion scatteringSurface layer atomic structureAl

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