HIGH ENERGY Xe+ ENHANCED ADHESION OF Al AND Ag FILMS ON OPTICAL GLASS

HIGH ENERGY Xe⁺ ENHANCED ADHESION OF Al AND Ag FILMS ON OPTICAL GLASS

Zhang Tonghe，

Liu Yili，

Sun Yinguan，

Shang Shixuan

Nuclear Science and Techniques

Vol.2, No.4

pp.236-239

Published in print 01 Nov 1991

22500

The samples consisting of 100nm Al or Ag film on optical glass substrate were irradiated by a beam of Xe 5 × 10¹⁵ to 2 × 10¹⁶ cm^-2 with energy 320 keV. The adhesion of films on substrates was tested by Xe⁺ irradiation. Optical character was measured by spectrophotometer. The ion mixing amount was measured by RBS. The results showed that after ion irradiating the adhesion of the film on the glass is enhanced. The adherent strength is greater than 10 kg/cm². The thermal stability of the films is good. The irradiated film is more optically efficient, the surface is smooth and rendered more corrosion resistance. The mechanism of the film adhesion was discussed.

High energy Xe+Bombard Al and Ag filmsIon beam enhanced adhesion

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