logo

Studies of preparing method of nano grain metal-insulator film Cu:CaF2

Studies of preparing method of nano grain metal-insulator film Cu:CaF2

Zhao Zi-Qiang
Wei Lun-Cun
Wang Hao
Zhong Yun-Cheng
Lu Xi-Ting
Nuclear Science and TechniquesVol.7, No.4pp.240-242Published in print 01 Nov 1996
29000

A machine to prepare nano grain metal-insulator films, for example Cu:CaF2 film, by means of magnetron sputtering generating clusters and at the same time evaporating insulator medium, is introduced. This machine is suitable for almost all solid metal and semiconductor clusters. And with it, many kinds of function film series can be prepared. The size of cluster embedded in insulator is from 10 to 70 nm. The Cu cluster and medium CaF2 are both polycrystalline structure.

Embedded clusterCrystalline structureNano grainsFilmMegnetron sputteringEvaporating
References
1 Wang Y, Suna A, Mahler W et al. J Chem Phys, 1987; 87: 7315
2 Rubia A, Serra L. Phys Rev, 1993; B48: 222
3 Chemla D S, Miller D A B. J Opt Soc Am, 1985; B2: 1155
4 Rnox W H, Hirlimann C, Miller D A B et al. Phys Rev Lett, 1985; 54: 1306
5 Habberland M, Karrais M.

Clusters and cluster-assembled materials

. In: Averback Robert S, ed, MRS symposium proceedings, Vol.206. 1991; 291
Baidu ScholarGoogle Scholar