DEPTH PROFILING OF DEUTERIUM IN Al2O3

DEPTH PROFILING OF DEUTERIUM IN Al₂O₃

Tan Xiaohua，

Luo Siwei，

Song Zheming，

Lai Zuwu，

Zhao Guoqing，

Zhou Zhuying

Nuclear Science and Techniques

Vol.6, No.3

pp.150-153

Published in print 01 Aug 1995

54600

$D_{2}^{+}$ ions of 70 and 90 keV were separately implanted into two thick samples of sintered alumina ceramic and the distribution of deuterium has been measured for three runs at an interval of 5 months using high energy proton backscattering and elastic recoil detection (ERD). The measured data show that there is little diffusion of deuterium in Al₂O₃ and the diffusion coefficient is deduced to be 1.1×10^-17cm²/s. The measured total concentration of implanted deuterium is 4.5×10¹⁸ at./cm². The profile of hydrogen adsorbed on the surface of A1₂O₃ samples was also observed by ERD and ¹H(¹⁹F, αγ)¹⁶O analysis. The distribution range of ¹H in Al₂O₃ after deuterium implantation is much larger than that before one.

Depth profilingDiffusion coefficientDeuteriumCeramic

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