PHASE ANALYSES FOR DUAL ION BEAM DEPOSITED ZrO2 FILMS ON NaCl SUBSTRATE

PHASE ANALYSES FOR DUAL ION BEAM DEPOSITED ZrO₂ FILMS ON NaCl SUBSTRATE

Huang Ningkang，

Wang Dezhi

Nuclear Science and Techniques

pp.202-205

Published in print 01 Nov 1994

22800

ZrO₂ films on NaCl(100) substrate produced by oxygen ion bombardment and argon ion sputtering of Zr are analysed using TEM, XRD and XPS. The result of TEM shows that only cubic phase exists for the ZrO₂ film produced by oxygen ion bombardment with 30μA/cm² and 200eV, while the XRD result shows that there seems to exhibit a small quanitity of monoclinic phase apart from cubic one under the production condition of oxygen ion of 25µA/cm², 100eV.

ZrO2 filmDual ion beam depositionIon SputteringTEMXRDXPS

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